[16] X.Y. Wang, C.G. Li, J.X. Ma et al, Deposition of Cr-Si-Ni-Mo films at a low sputtering current and performance of heat and humid resistance. Applied Surface Science，289(2014) 539–544.

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上一条:[15] X.Y. Wang, J.X. Ma, C.G. Li et al, Structure and electrical properties of quaternary Cr-Si-Ni-W films prepared by ion beam sputter deposition. Journal of Alloys and Compounds，604(2014)12–19.