Huiquan Qin, Xia Xiao*, Xiaole Sui, Haiyang Qi; Influence of Residual Stress on the Determination of Young's Modulus for SiO2 Thin Film by the Surface Acoustic Waves, Japanese Journal of Applied Physics, 58: SHHG01, 2019. (SCI JCR_Q4)
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Title of Paper:Huiquan Qin, Xia Xiao*, Xiaole Sui, Haiyang Qi; Influence of Residual Stress on the Determination of Young's Modulus for SiO2 Thin Film by the Surface Acoustic Waves, Japanese Journal of Applied Physics, 58: SHHG01, 2019. (SCI JCR_Q4)
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